留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

直流磁控溅射ZnO:Al薄膜的光电和红外发射特性

王文文 刁训刚 王峥 王天民

王文文, 刁训刚, 王峥, 等 . 直流磁控溅射ZnO:Al薄膜的光电和红外发射特性[J]. 北京航空航天大学学报, 2005, 31(02): 236-241.
引用本文: 王文文, 刁训刚, 王峥, 等 . 直流磁控溅射ZnO:Al薄膜的光电和红外发射特性[J]. 北京航空航天大学学报, 2005, 31(02): 236-241.
Wang Wenwen, Diao Xungang, Wang Zheng, et al. Optical, electrical and infrared emissing properties of DC magnetron sputtered ZnO:Al thin films[J]. Journal of Beijing University of Aeronautics and Astronautics, 2005, 31(02): 236-241. (in Chinese)
Citation: Wang Wenwen, Diao Xungang, Wang Zheng, et al. Optical, electrical and infrared emissing properties of DC magnetron sputtered ZnO:Al thin films[J]. Journal of Beijing University of Aeronautics and Astronautics, 2005, 31(02): 236-241. (in Chinese)

直流磁控溅射ZnO:Al薄膜的光电和红外发射特性

详细信息
    作者简介:

    王文文(1980-),女,山东临沂人,博士生, wangww1016@163.com.

  • 中图分类号: O 472+1; O 472+3; O 472+4

Optical, electrical and infrared emissing properties of DC magnetron sputtered ZnO:Al thin films

  • 摘要: 以锌、铝合金(ω(Al)=3%)为靶材,利用直流反应磁控溅射法制备了系列掺铝氧化锌ZnO:Al(ZAO)薄膜样品,通过X射线衍射(XRD)、扫描电子显微镜(SEM)、分光光度计、霍耳效应及红外发射率测量仪等测试仪器或方法表征了样品的结构、形貌、光学、电学及红外发射特性.测得样品最低电阻率达到1.8×10-6(Ω·m),最大禁带宽度为3.47 eV,可见光区平均透过率达到90%,8~14 μm波段平均红外发射率在0.26~0.9之间.上述特性均随衬底温度和溅射功率的变化有着规律的变化.当方块电阻小于45 Ω时,薄膜在8~14 μm波段平均红外发射率与方块电阻遵循二阶函数变化规律.

     

  • [1] Beneking C, Rech B, Wieder S, et al. Recent developments of silicon thin film solar cells on glass substrates[J]. Thin Solid Films,1999,351:241~246 [2] 徐成海,陆 峰,谢元华. 氧化锌铝透明导电膜[J].真空电子技术,2003,(6):39~49 Xu Chenghai, Lu Feng, Xie Yuanhua. Transparent conductive zinc, aluminium oxide films[J]. Technology of Vacuum Electric, 2003,(6):39~49(in Chinese) [3] Chopra K L, Major S, Pandya D K. Transparent conductors—a status review[J]. Thin Solid Films, 1983, 102:1~46 [4] Ellmer K, Kudella F, Mientus R, et al. Influence of discharge parameters on the layer properties of reactive magnetron sputtered ZnO:Al films[J]. Thin Solid Films, 1994, 247:15~23 [5] Zafar S, Ferekides C S, Morel D L. Characterization and analysis of ZnO:Al deposited by reactive magnetron sputtering[J]. Journal of Vacuum Science and Technology A, 1995, 13:2177~2182 [6] Hong R J, Jiang X, Heide G, et al. Growth behaviours and properties of the ZnO:Al films prepared by reactive mid-frequency magnetron sputtering[J]. Journal of Crystal Growth, 2003,249:461~469 [7] Szyszka B, Sittinger V, Jiang X, et al. Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering[J]. Thin Solid Films, 2003,442:179~183 [8] 范志新,陈玖琳,孙以材. ZAO透明导电薄膜的特性、制备与应用[J]. 真空,2000,(5):10~14 Fan Zhixin, Chen Jiulin, Sun Yicai. Propertis, preparation and application of transparent conductive ZAO thin films[J]. Vacuum, 2000,(5):10~14(in Chinese) [9] 裴志亮,谭明晖,陈 猛,等. 透明导电氧化物ZnO:Al(ZAO)薄膜的研究[J]. 金属学报,2000,36(1):72~76 Pei Zhiliang, Tan Minghui, Chen Meng, et al. Study of transparent conductive oxides ZnO:Al(ZAO)thin films[J]. Journal of Metal, 2000,36(1):72~76(in Chinese) [10] 陈 源,张德恒,马 瑾. 不同有机衬底上沉积的ZnO:Al透明导电膜的研究[J]. 半导体杂志,1999,24(3):1~4 Chen Yuan, Zhang Deheng, Ma Jin. Study of ZnO:Al transparent conductive films deposited on different organic substrates[J]. Journal of Semiconductor, 1999,24(3):1~4(in Chinese) [11] 裴志亮,孙 超,关德慧,等. ZnO:Al(ZAO)薄膜的特性研究[J]. 自然科学进展,2001,(4):392~397 Pei Zhiliang, Sun Chao, Guan Dehui, et al. Study of the properties of ZnO:Al(ZAO) thin films[J]. Development of Natural Science, 2001,(4):392~397(in Chinese) [12] 唐伟忠. 薄膜材料制备原理、技术及应用[M].第二版.北京:冶金工业出版社,1999,119~122 Tang Weizhong. Preparation theory, technology and application of thin film materials[M]. 2 Edition. Beijing:Metallurgical Industry Press, 1999, 119~122 (in Chinese) [13] Hao X T, Ma J, Ma H L, et al. Characterization of ZnO:Al films deposited by radio frequency magnetron-sputtering at low temperature[J]. Science in China A, 2002, 45(3):394~399 [14] Frank G, Kauer E, Kostlin H. Transparent heat-reflecting coatings based on highly doped semiconductors[J]. Thin Solid Films, 1981, 77:107 [15] Szczyrbowski J, Brauer G, Ruske M, et al. New low emissivity coating based on TwinMag sputtered TiO2 and Si3N4 layers[J]. Thin Solid Films, 1999, 351:254~259 [16] Mardare D, Tasca M, Delibas M, et al. On the structural properties and optical transmittance of TiO2 radio frequency sputtered thin films[J]. Applied Surface Science, 2000,156:200~206
  • 加载中
计量
  • 文章访问数:  2903
  • HTML全文浏览量:  184
  • PDF下载量:  1507
  • 被引次数: 0
出版历程
  • 收稿日期:  2004-06-20
  • 网络出版日期:  2005-02-28

目录

    /

    返回文章
    返回
    常见问答