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热铁盘法高速抛光CVD金刚石

马泳涛 孙玉静 陈五一

马泳涛, 孙玉静, 陈五一等 . 热铁盘法高速抛光CVD金刚石[J]. 北京航空航天大学学报, 2008, 34(04): 412-416.
引用本文: 马泳涛, 孙玉静, 陈五一等 . 热铁盘法高速抛光CVD金刚石[J]. 北京航空航天大学学报, 2008, 34(04): 412-416.
Ma Yongtao, Sun Yujing, Chen Wuyiet al. High speed polishing CVD diamonds with hot metal plate[J]. Journal of Beijing University of Aeronautics and Astronautics, 2008, 34(04): 412-416. (in Chinese)
Citation: Ma Yongtao, Sun Yujing, Chen Wuyiet al. High speed polishing CVD diamonds with hot metal plate[J]. Journal of Beijing University of Aeronautics and Astronautics, 2008, 34(04): 412-416. (in Chinese)

热铁盘法高速抛光CVD金刚石

详细信息
    作者简介:

    马泳涛(1975-),男,河南郑州人,博士生,myt_ma@126.com.

  • 中图分类号: TB 43

High speed polishing CVD diamonds with hot metal plate

  • 摘要: 利用高速热铁盘抛光设备对化学气相沉积(CVD,Chemical Vapor Deposition)金刚石进行抛光,分别进行温度、转速、压力以及抛光时间的实验.采用光学天平对抛光前后金刚石称重对比,采用工具显微镜和原子力显微镜对抛光后表面进行研究.结果表明:较高的抛光速度对提高表面质量以及抛光效率均比较有利.在抛光温度850 ℃,速度164 mm/s,压力24.892 N的条件下,抛光120 min后,金刚石表面的粗糙度由原来的Ra=9.67 μm下降到Ra=0.016 μm.原子力显微镜显示,抛光表面存在少数高度在60~70 nm之间的突峰,其高度是普通峰高的2~3倍,且峰的形状呈现出一定的方向性.这种表面微观规律与抛光时采用的直压式运动方式有关.

     

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出版历程
  • 收稿日期:  2007-03-29
  • 网络出版日期:  2008-04-30

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