Volume 31 Issue 02
Feb.  2005
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Wang Wenwen, Diao Xungang, Wang Zheng, et al. Optical, electrical and infrared emissing properties of DC magnetron sputtered ZnO:Al thin films[J]. Journal of Beijing University of Aeronautics and Astronautics, 2005, 31(02): 236-241. (in Chinese)
Citation: Wang Wenwen, Diao Xungang, Wang Zheng, et al. Optical, electrical and infrared emissing properties of DC magnetron sputtered ZnO:Al thin films[J]. Journal of Beijing University of Aeronautics and Astronautics, 2005, 31(02): 236-241. (in Chinese)

Optical, electrical and infrared emissing properties of DC magnetron sputtered ZnO:Al thin films

  • Received Date: 20 Jun 2004
  • Publish Date: 28 Feb 2005
  • Aluminium-doped zinc oxide (ZnO:Al) films were deposited on glass substrate by DC reactive magnetron sputtering from a Zn-Al metallic target (ω(Al)=3%). Films with novel, tangly string-like surface morphology, an average optical transmittance up to 90% in the visible range, a widest band gap of 3.47 eV and electrical resistivity down to 1.80×10-6 Ω·m were obtained. The infrared emissivity in 8~14 μm waveband is distributed in the range of 0.26~0.9. The surface morphology, crystallinity, infrared emissivity as well as the electrical and optical properties of the samples were characterized using X-ray diffraction, scanning electron microscopy, spectrophotometry, infrared radiometer and Hall-effect measurement. The optical, electrical and infrared emissing properties of the films depend on substrate temperature and sputtering power obviously and regularly. The relationship between sheet resistance and infrared emissivity of ZnO:Al(ZAO) thin films follows a quadratic function as the sheet resistance is below 45 Ω.

     

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  • [1] Beneking C, Rech B, Wieder S, et al. Recent developments of silicon thin film solar cells on glass substrates[J]. Thin Solid Films,1999,351:241~246 [2] 徐成海,陆 峰,谢元华. 氧化锌铝透明导电膜[J].真空电子技术,2003,(6):39~49 Xu Chenghai, Lu Feng, Xie Yuanhua. Transparent conductive zinc, aluminium oxide films[J]. Technology of Vacuum Electric, 2003,(6):39~49(in Chinese) [3] Chopra K L, Major S, Pandya D K. Transparent conductors—a status review[J]. Thin Solid Films, 1983, 102:1~46 [4] Ellmer K, Kudella F, Mientus R, et al. Influence of discharge parameters on the layer properties of reactive magnetron sputtered ZnO:Al films[J]. Thin Solid Films, 1994, 247:15~23 [5] Zafar S, Ferekides C S, Morel D L. Characterization and analysis of ZnO:Al deposited by reactive magnetron sputtering[J]. Journal of Vacuum Science and Technology A, 1995, 13:2177~2182 [6] Hong R J, Jiang X, Heide G, et al. Growth behaviours and properties of the ZnO:Al films prepared by reactive mid-frequency magnetron sputtering[J]. Journal of Crystal Growth, 2003,249:461~469 [7] Szyszka B, Sittinger V, Jiang X, et al. Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering[J]. Thin Solid Films, 2003,442:179~183 [8] 范志新,陈玖琳,孙以材. ZAO透明导电薄膜的特性、制备与应用[J]. 真空,2000,(5):10~14 Fan Zhixin, Chen Jiulin, Sun Yicai. Propertis, preparation and application of transparent conductive ZAO thin films[J]. Vacuum, 2000,(5):10~14(in Chinese) [9] 裴志亮,谭明晖,陈 猛,等. 透明导电氧化物ZnO:Al(ZAO)薄膜的研究[J]. 金属学报,2000,36(1):72~76 Pei Zhiliang, Tan Minghui, Chen Meng, et al. Study of transparent conductive oxides ZnO:Al(ZAO)thin films[J]. Journal of Metal, 2000,36(1):72~76(in Chinese) [10] 陈 源,张德恒,马 瑾. 不同有机衬底上沉积的ZnO:Al透明导电膜的研究[J]. 半导体杂志,1999,24(3):1~4 Chen Yuan, Zhang Deheng, Ma Jin. Study of ZnO:Al transparent conductive films deposited on different organic substrates[J]. Journal of Semiconductor, 1999,24(3):1~4(in Chinese) [11] 裴志亮,孙 超,关德慧,等. ZnO:Al(ZAO)薄膜的特性研究[J]. 自然科学进展,2001,(4):392~397 Pei Zhiliang, Sun Chao, Guan Dehui, et al. Study of the properties of ZnO:Al(ZAO) thin films[J]. Development of Natural Science, 2001,(4):392~397(in Chinese) [12] 唐伟忠. 薄膜材料制备原理、技术及应用[M].第二版.北京:冶金工业出版社,1999,119~122 Tang Weizhong. Preparation theory, technology and application of thin film materials[M]. 2 Edition. Beijing:Metallurgical Industry Press, 1999, 119~122 (in Chinese) [13] Hao X T, Ma J, Ma H L, et al. Characterization of ZnO:Al films deposited by radio frequency magnetron-sputtering at low temperature[J]. Science in China A, 2002, 45(3):394~399 [14] Frank G, Kauer E, Kostlin H. Transparent heat-reflecting coatings based on highly doped semiconductors[J]. Thin Solid Films, 1981, 77:107 [15] Szczyrbowski J, Brauer G, Ruske M, et al. New low emissivity coating based on TwinMag sputtered TiO2 and Si3N4 layers[J]. Thin Solid Films, 1999, 351:254~259 [16] Mardare D, Tasca M, Delibas M, et al. On the structural properties and optical transmittance of TiO2 radio frequency sputtered thin films[J]. Applied Surface Science, 2000,156:200~206
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