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Volume 24 Issue 1
Jan.  1998
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Journal of Beijing University of Aeronautics and Astronautics  > 1998  >  24(1): 108-111.
Qi Xianglin, Cheng Xianan, Song Ruan, et al. Resistance Relexation of NiSiB Amorphous Films[J]. Journal of Beijing University of Aeronautics and Astronautics, 1998, 24(1): 108-111. (in Chinese)
Citation: Qi Xianglin, Cheng Xianan, Song Ruan, et al. Resistance Relexation of NiSiB Amorphous Films[J]. Journal of Beijing University of Aeronautics and Astronautics, 1998, 24(1): 108-111. (in Chinese)
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Resistance Relexation of NiSiB Amorphous Films

  • 1.

    Beijing University of Aeronautics and Astronautics,Dept.of Applied Mathematics and Physics

  • 2. Computer Institute of Beijing Polytechnic University

  • Received Date: 10 Jul 1996
  • Publish Date: 31 Jan 1998
    Abstract
  • A series of NiSiB films of various thickness were prepared by R.F.sputtering.The films were annealed at different temperature and for different time.The resistance of the annealed films were measured as a function of temperature during two or more heating cooling cycles.Measurements of annealed films showed that there were two forms of resistance versus temperature curves.One was reversible the other was irreversible.The resistance of the thicker films (>1000) increased with increasing temperature and the resistance of thinner films (<400) decreased with an increase in the temperature.The temperature coefficient of resistance may be positive or negative.From the relaxation of amorphous material these behaviours are disscussed based on the activation energy spectra and in terms of extatended Ziman theory for metallic glasses.

     

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    • References(1)
  • 1. Fukmichi K,Kimura H M,Masumoto T.Strain gauge characteristics of Ni base amorphous alloys.IEEE Transaction on Magnetics,1980,16(5):907~909 2. 程先安,陈秉玉,姚慈顺.压力敏感元件新材料的实验研究.北京航空学院学报,1984(1):1~6 3. Cheng X,Gu G,Chen B.Electrical resistance strain characteristics and structure of amorphous NiSiB thin films.SPIE,1991,1519(part one):33~36 4. Kuhrast F A,Machizaud F,Flechon J,et al.Electrical conductivity of amorphous Ni-{66.} B-{34.} film.Thin Solid Film,1981,81:181~186 5. Nagel R.Temperature dependence of the resistivity in metallic glasses.Physical Review B,1977,16(4):1694~1698 6. Gibbs M R J,Evetts J E,Leake J A.Activation energy spectra and relaxation in amorphous materials.Journal of Materials Science,1983,18:278~288
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