Volume 24 Issue 5
May  1998
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Song Ruan, Cheng Xianan, Qi Xianglinet al. Motion of Microwave Plasma Electrons in the Action of Magnetic Field[J]. Journal of Beijing University of Aeronautics and Astronautics, 1998, 24(5): 599-602. (in Chinese)
Citation: Song Ruan, Cheng Xianan, Qi Xianglinet al. Motion of Microwave Plasma Electrons in the Action of Magnetic Field[J]. Journal of Beijing University of Aeronautics and Astronautics, 1998, 24(5): 599-602. (in Chinese)

Motion of Microwave Plasma Electrons in the Action of Magnetic Field

  • Received Date: 04 Jun 1997
  • Publish Date: 31 May 1998
  • In rectangular microwave resonator, under the action of high frequency electro-magnetic field and inhomogeneous static magnetic field, the electron cyclotron resonance motion of the plasma electrons have been studied. Writing out the Newton equations of motion of the electrons and by using the numerical method, the trajectory and the behavier of the motion of the electrons were computed and drawn out by computer. The energy of the electrons were also computed. Form the computed results,the characteristics of the motion and the energy absorbed by the electrons were analyzed.

     

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  • 1. Toyama H, Okabayashi M, Ishizuka H. Plasma acceleration using a high frequency field and a static magnetic field.Plasma Phys, 1968,10:319~336 2. 宋汝安,程先安,周忠毅.磁场-微波等离子体与大面积金刚石薄膜.物理学报,1990,39:1635~1639 3. Matsuo S, Adachi Y. Reactiv ion beam etching using a broad beam ECR ion source. Jpn J Appl Phys,1981,21:L4~L6 4. Matsuo S, Kiuchi M. Low temperature chemical vapor deposition method utilizing an electron cyclotron resonance plasma. Jpn J Appl Phys, 1983,22:L210~L212
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