Volume 49 Issue 12
Dec.  2023
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SHI Z,WANG B,YANG B,et al. Single-event radiation hardening method for 14 nm pFinFET device[J]. Journal of Beijing University of Aeronautics and Astronautics,2023,49(12):3335-3342 (in Chinese) doi: 10.13700/j.bh.1001-5965.2022.0071
Citation: SHI Z,WANG B,YANG B,et al. Single-event radiation hardening method for 14 nm pFinFET device[J]. Journal of Beijing University of Aeronautics and Astronautics,2023,49(12):3335-3342 (in Chinese) doi: 10.13700/j.bh.1001-5965.2022.0071

Single-event radiation hardening method for 14 nm pFinFET device

doi: 10.13700/j.bh.1001-5965.2022.0071
Funds:  National Science and Technology Major Project (2020002-047)
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  • Corresponding author: E-mail:liu-wp@163.com
  • Received Date: 14 Feb 2022
  • Accepted Date: 16 Apr 2022
  • Publish Date: 28 Apr 2022
  • In order to investigate the reliability of advanced complementary metal-oxide-semiconductor (CMOS) processes for space applications, a hardening strategy against single-event transient (SET) is investigated in P-channel fin field-effect transistor (pFinFET) devices at 14 nm. The effects of SETs are mitigated by inserting heavily doped N-type trenches (Ntie) and P-type trenches (Ptie) parallel to the fin direction in the device. Three-dimensional TCAD simulations show that the resistance to SET of the device by introducing trenches is related to the bias conditions of the trenches themselves. The SET voltage pulse amplitude increases significantly when the trenches are in the reverse-bias state due to the presence of a special charge collection process, in addition to a slight decrease in pulse width compared to the unhardened devices, which results in the best radiation-hardening performance when the trenches are at zero bias and have a reduction in SET pulse width of about 40%. Besides, the impact of trench area, spacing, and doping concentration on the SET pulse width in the pFinFET is also investigated, obtaining the device parameters with the best resistance to SET.

     

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