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电子照射对硅漂移探测器性能的影响

张斌全 韦飞 冷双 王世金

张斌全, 韦飞, 冷双, 等 . 电子照射对硅漂移探测器性能的影响[J]. 北京航空航天大学学报, 2013, 39(2): 235-238.
引用本文: 张斌全, 韦飞, 冷双, 等 . 电子照射对硅漂移探测器性能的影响[J]. 北京航空航天大学学报, 2013, 39(2): 235-238.
Zhang Binquan, Wei Fei, Leng Shuang, et al. Effect on the characteristic of silicon drift detector by electron exposure[J]. Journal of Beijing University of Aeronautics and Astronautics, 2013, 39(2): 235-238. (in Chinese)
Citation: Zhang Binquan, Wei Fei, Leng Shuang, et al. Effect on the characteristic of silicon drift detector by electron exposure[J]. Journal of Beijing University of Aeronautics and Astronautics, 2013, 39(2): 235-238. (in Chinese)

电子照射对硅漂移探测器性能的影响

详细信息
  • 中图分类号: V476.4

Effect on the characteristic of silicon drift detector by electron exposure

  • 摘要: 由于高能电子辐射的长期照射,新一代太阳X射线探测器硅漂移传感器的探测性能可能发生变化.通过用电子放射源模拟空间电子对硅漂移探测器进行辐射照射试验,以测试电子照射对传感器能量分辨率、效率、信号幅度等性能的影响.试验结果表明,长期的电子照射造成硅漂移探测器面损伤和体损伤,使其漏电流增大,信号幅度减小,能量分辨率也受到照射的影响,而探测效率未发生变化.

     

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出版历程
  • 收稿日期:  2011-11-19
  • 网络出版日期:  2013-02-28

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