留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

热铁盘法高速抛光CVD金刚石

马泳涛 孙玉静 陈五一

马泳涛, 孙玉静, 陈五一等 . 热铁盘法高速抛光CVD金刚石[J]. 北京航空航天大学学报, 2008, 34(04): 412-416.
引用本文: 马泳涛, 孙玉静, 陈五一等 . 热铁盘法高速抛光CVD金刚石[J]. 北京航空航天大学学报, 2008, 34(04): 412-416.
Ma Yongtao, Sun Yujing, Chen Wuyiet al. High speed polishing CVD diamonds with hot metal plate[J]. Journal of Beijing University of Aeronautics and Astronautics, 2008, 34(04): 412-416. (in Chinese)
Citation: Ma Yongtao, Sun Yujing, Chen Wuyiet al. High speed polishing CVD diamonds with hot metal plate[J]. Journal of Beijing University of Aeronautics and Astronautics, 2008, 34(04): 412-416. (in Chinese)

热铁盘法高速抛光CVD金刚石

详细信息
    作者简介:

    马泳涛(1975-),男,河南郑州人,博士生,myt_ma@126.com.

  • 中图分类号: TB 43

High speed polishing CVD diamonds with hot metal plate

  • 摘要: 利用高速热铁盘抛光设备对化学气相沉积(CVD,Chemical Vapor Deposition)金刚石进行抛光,分别进行温度、转速、压力以及抛光时间的实验.采用光学天平对抛光前后金刚石称重对比,采用工具显微镜和原子力显微镜对抛光后表面进行研究.结果表明:较高的抛光速度对提高表面质量以及抛光效率均比较有利.在抛光温度850 ℃,速度164 mm/s,压力24.892 N的条件下,抛光120 min后,金刚石表面的粗糙度由原来的Ra=9.67 μm下降到Ra=0.016 μm.原子力显微镜显示,抛光表面存在少数高度在60~70 nm之间的突峰,其高度是普通峰高的2~3倍,且峰的形状呈现出一定的方向性.这种表面微观规律与抛光时采用的直压式运动方式有关.

     

  • [1] 徐峰, 左敦稳, 王珉, 等. CVD金刚石厚膜的机械抛光及其残余应力的分析[J]. 人工晶体学报,2004, 33(3):436-440 Xu Feng, Zuo Dunwen, Wang Min, et al. Study on mechanical polishing for CVD diamond thick film and its residual stresses[J]. Journal of Synthetic Crystals,2004,33(3):436-440(in Chinese) [2] Yoshikawa M, Okuzumi F. Hot-iron-metal polishing machine for CVD diamond films and characteristics of the polished surfaces[J]. Surface and Coatings Technology,1997,88(1/2/3):197-203 [3] Wang C Y, Zhang F L, Kuang T C, et al. Chemical/mechanical polishing of diamond films assisted by molten mixture of LiNO3 and KNO3[J]. Thin Solid Films,2006,496(2):698-702 [4] Gloor S, Luthy W, Weber H P. UV laser polishing of thick diamond films for IR windows[J]. Applied Surface Science,1999,138(1/2/3/4):135-139 [5] Leech P W, Reeves G K, Holland A S, et al. Ion beam etching of CVD diamond film in Ar, Ar/O2 and Ar/CF4 gas mixtures[J]. Diamond and Related Materials,2002, 11(3/4/5/6):833-836 [6] Ollison C D, Brown W D, Malshe A P, et al. A comparison of mechanical lapping versus chemical-assisted mechanical polishing and planarization of chemical vapor deposited (CVD) diamond[J]. Diamond and Related Materials,1999,8(6):1083-1090 [7] Tsai H Y, Ting C J, Chou C P. Evaluation research of polishing methods for large area diamond films produced by chemical vapor deposition[J]. Diamond and Related Materials,2007,16(2):253-261 [8] Malshe A P, Park B S. A review of techniques for polishing and planarizing chemically vapor-deposited(CVD) diamond films and substrates[J]. Diamond and Related Materials,1999,8:1198-1213 [9] Yoshikawa M. Development and performance of a diamond-film polishing apparatus with hot metals Proceedings of SPIE-The International Society for Optical Engineering. Bellingham,WA:SPIE,1990,1325:210-221 [10] Zaitsev A M, Kosaca G, Richarz B, et al. Thermochemical polishing of CVD diamond films[J]. Diamond and Related Materials,1998,7:1108-1117
  • 加载中
计量
  • 文章访问数:  3144
  • HTML全文浏览量:  76
  • PDF下载量:  986
  • 被引次数: 0
出版历程
  • 收稿日期:  2007-03-29
  • 网络出版日期:  2008-04-30

目录

    /

    返回文章
    返回
    常见问答